Thin-film limit formalism applied to surface defect absorption

Thin-film limit formalism applied to surface defect absorption.

The thin-film limit is derived by a nonconventional approach and equations for transmittance, reflectance and absorptance are presented in highly versatile and accurate form. In the thin-film limit the optical properties do not depend on the absorption coefficient, thickness and refractive index individually, but only on their product. We show that this formalism is applicable to the problem of...

Electrochemical defect-mediated thin-film growth

An electrodeposition technique is described that produces atomically flat epitaxial metal overlayers of quality similar to that obtained by ultrahigh vacuum techniques at elevated temperature. In this approach, a metal of interest such as silver is co-deposited with a reversibly deposited mediator metal. The mediator is periodically deposited and stripped from the surface, and this serves to si...

The \ Linear " Limit of Thin Film Flowsas

Angular behavior of the absorption limit in thin film silicon solar cells

We investigate the angular behavior of the upper bound of absorption provided by the guided modes in thin film solar cells. We show that the 4n limit can be potentially exceeded in a wide angular and wavelength range using two-dimensional periodic thin film structures. Two models are used to estimate the absorption enhancement; in the first one, we apply the periodicity condition along the thic...

Modeling and Control of Thin Film Surface Morphology : Application to Thin Film Solar Cells

OF THE DISSERTATION Modeling and Control of Thin Film Surface Morphology: Application to Thin Film Solar Cells